节点文献
Optimization based on sensitivity for material birefringence in projection lens
【摘要】 Polarization aberration caused by material birefringence can be partially compensated by lens clocking. In this Letter, we propose a fast and efficient clocking optimization method. First, the material birefringence distribution is fitted by the orientation Zernike polynomials. On this basis, the birefringence sensitivity matrix of each lens element can be calculated. Then we derive the rotation matrix of the orientation Zernike polynomials and establish a mathematical model for clocking optimization. Finally, an optimization example is given to illustrate the efficiency of the new method. The result shows that the maximum RMS of retardation is reduced by 64% using only 48.99 s.
【Abstract】 Polarization aberration caused by material birefringence can be partially compensated by lens clocking. In this Letter, we propose a fast and efficient clocking optimization method. First, the material birefringence distribution is fitted by the orientation Zernike polynomials. On this basis, the birefringence sensitivity matrix of each lens element can be calculated. Then we derive the rotation matrix of the orientation Zernike polynomials and establish a mathematical model for clocking optimization. Finally, an optimization example is given to illustrate the efficiency of the new method. The result shows that the maximum RMS of retardation is reduced by 64% using only 48.99 s.
【Key words】 birefringence; polarization aberration; projection lens;
- 【文献出处】 Chinese Optics Letters ,中国光学快报(英文版) , 编辑部邮箱 ,2020年06期
- 【分类号】TH74
- 【被引频次】2
- 【下载频次】24