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镍-磷-氮化硅复合化学镀工艺优化
Optimization for electroless plating of nickel–phosphate–silicon nitride composite coating
【摘要】 以Q235碳钢为基底进行Ni–P–Si3N4复合化学镀。以镀层的显微硬度为指标,通过正交试验得到的最优配方和工艺条件为:硫酸镍29 g/L,次磷酸钠30 g/L,氟化氢铵15 g/L,柠檬酸三钠10 g/L,硫脲0.003 g/L,氮化硅2 g/L,十二烷基硫酸钠0.04 g/L,pH 4.5,温度85℃,时间1.5 h。该条件下所得Ni–P–Si3N4复合镀层为非晶态结构,表面平整致密,厚度47.8μm,显微硬度313.4 HV,结合力良好。
【Abstract】 Electroless plating of Ni–P–Si3N4 composite coating was conducted on Q235 steel substrate. The bath composition and process conditions were optimized using the microhardness of coating as evaluation index as follows: nickel sulfate 29.0 g/L, sodium hypophosphite 30.0 g/L, ammonium hydrogen fluoride 15.0 g/L, sodium citrate 10.0 g/L, thiourea 0.003 g/L, silicon nitride 2.0 g/L, sodium dodecyl sulfate 0.04 g/L, pH 4.5, and time 1.5 h. The Ni–P–Si3N4 composite coating obtained thereby was smooth, compact, and well-adhered with an amorphous structure, a thickness of 47.8 μm, and a microhardness of 313.4 HV.
【Key words】 electroless plating; nickel–phosphorus alloy; silicon nitride; composite coating; microhardness;
- 【文献出处】 电镀与涂饰 ,Electroplating & Finishing , 编辑部邮箱 ,2020年12期
- 【分类号】TG174.4
- 【被引频次】2
- 【下载频次】146