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前驱体温度对激光化学气相沉积YBa2Cu3O7-δ超导薄膜结构及性能的影响
Effect of precursor temperature on structure and properties of YBa2Cu3O7-δ superconducting thin films prepared by laser chemical vapor deposition
【摘要】 采用激光化学气相沉积法在Al2O3基底上以49μm·h-1的沉积速率高速制备了c-轴取向的YBa2Cu3O7-δ薄膜,其中,激光功率为133 W,沉积温度1103 K,腔体压强800 Pa。研究了前驱体蒸发温度及薄膜退火温度对薄膜电学性能的影响。研究表明,Ba、Cu、Y前驱体加热温度分别为603、478、459 K时制备的薄膜在经813 K高温热处理12 h后,临界温度可达83 K。
【Abstract】 c-axis-oriented YBa2Cu3O7-δ film was prepared on Al2O3 substrates at a deposition rate of 49 μm·h-1 by laser chemical vapor deposition at a laser power of 133 W, with corresponding deposition temperature of 1103 K and total pressure of 800 Pa. Effects of the evaporation temperature and annealing temperature on the electrical properties of the film were investigated. The YBa2Cu3O7-δ film showed a critical temperature of 83 K after heat-treated at 813 K for 12 h when the evaporation temperature of Ba, Cu, and Y precursors were 603 K, 478 K, and 459 K, respectively.
【Key words】 laser chemical vapor deposition; YBa2Cu3O7-δ film; high deposition rate;
- 【文献出处】 材料科学与工艺 ,Materials Science and Technology , 编辑部邮箱 ,2020年02期
- 【分类号】O511.3;TB383.2
- 【被引频次】1
- 【下载频次】536