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产生大面积均匀面电子源的电子枪设计

Designof New Electron Gun Capable of Generating Uniform Electron-Beam with Large Width

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【作者】 顾运厅林焱剑闫保军刘术林杨玉真余洋温凯乐王玉漫

【Author】 Gu Yunting;Lin Yanjian;Yan Baojun;Liu Shulin;Yang Yuzhen;Yu Yang;Wen Kaile;Wang Yuman;School of Physical Science and Technology,Guangxi University;State Key Laboratory of Particle Detection and Electronics,Institute of High Energy Physics,Chinese Academy of Sciences;University of Chinese Academy of Sciences;College of Science,Xi’an University of Technology;School of Physics,Nanjing University;

【通讯作者】 闫保军;

【机构】 广西大学物理科学与工程技术学院中国科学院高能物理研究所核探测与核电子学国家重点实验室中国科学院大学西安理工大学理学院南京大学物理学院

【摘要】 为了满足大尺寸微通道板(MCP)的性能测试和电子清刷除气处理,设计了一种电子枪,可以产生尺寸大、均匀性好、动态范围宽的平面电子源。该电子枪采用功函数较低的钽丝,加工成盘香式结构,通过外加电场,使得出射后打到微通道板输入面上的电子源束流密度可调、均匀性优于90%,12 h内的稳定性优于±0.1μA,动态范围达到7个数量级(10-12~10-5 A),可以实现对直径为50 mm的微通道板进行精确测试和严格的电子清刷处理,也可以应用于其它领域。

【Abstract】 A novel type of electron gun,capable of generating uniform e-beam with a large beam width and a narrow energy spread,was developed for the purposes of degassing by e-beam scrubbing and evaluation of large-sized microchannel plate(MCP) with e-beam.The original work was the tantalum filament in a shape of flat-spiral coil because of its lower work function.The characteristics of the prototyped e-gun were experimentally tested and evaluated.The results show that the e-beam had a uniformity of higher than 90%,a stability of better than ±0.1 μA within a period of 12 h,and a dynamic range up to 7-order of magnitude(10-12~10-5 A).In addition,the e-beam,generated by the novel electron gun,was used to rigorously characterize the properties of an MCP,50 mm in diameter and degassed by e-beam scrubbing.

【基金】 国家自然科学基金资助项目(11535014,11675278);核探测与核电子学国家重点实验室资助项目(SKLPDE-ZZ-201920)
  • 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2019年12期
  • 【分类号】TN12
  • 【被引频次】3
  • 【下载频次】187
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