【摘要】 利用（NH₄）₂SiF₆修饰大孔玻璃基底后,在溶剂热条件下制备了SIFSIX-3-Ni膜,并研究了温度和浓度对制备SIFSIX-3-Ni膜的影响.能谱分析（XPS）结果表明大孔玻璃表面引入了氟元素. SIFSIX-3-Ni膜的粉末X射线衍射（PXRD）峰位置和模拟结果一致,表明成功制备出SIFSIX-3-Ni膜.从扫描电子显微镜（SEM）照片中观察到膜连续均匀,厚度约为20μm.热重分析（TGA）结果表明,活化前的膜没有客体分子.单组分测试结果表明,膜的H₂, CO₂和N₂渗透量分别为6.83×10^-6, 7.42×10^-7和8.89×10^-7 mol·m^-2·s^-1·Pa^-1, H₂/CO₂和H₂/N₂的理想分离比分别为9.20和7.68.在连续测试5 h后, H₂, CO₂和N₂渗透量基本保持不变,表明SIFSIX-3-Ni膜具有很好的稳定性.更多还原

【Abstract】 Using the macroporous glass-frit disk modified by（NH₄）₂SiF₆ as the substrate, we prepared the SIFSIX-3-Ni membrane by the in situ growth method under solvothermal conditions. The effect of temperature and concentration on the preparation of SIFSIX-3-Ni membrane were investigated in detail. X-Ray photoelectron spectroscopy（XPS） demonstrates that F atom was integrated into the substrate surface. The powder X-ray diffraction（PXRD） patterns were in accordance with the simulated one, indicating that we obtained SIFSIX-3-Ni membranes successfully. Scanning electron microscopy（SEM） showed that the SIFSIX-3-Ni-3 membrane was continuous and uniform with a thickness of about 20 μm. Thermogravimetric analysis（TGA） showed that there was no guest molecules in the membrane before activation. Single gas permeation measurement on SIFSIX-3-Ni-3 membrane demonstrated that the permeability of H₂, CO₂ and N₂ were 6.83×10^-6, 7.42×10^-7 and 8.89×10^-7 mol·m^-2·s^-1·Pa^-1 respectively, and the ideal selectivities of H₂/CO₂ and H₂/N₂ were 9.20 and 7.68 respectively. The membrane can retain almost the same permeance of H₂, CO₂ and N₂ after 5 h of continuous testing, indicating that SIFSIX-3-Ni membrane have good stability.更多还原