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基于紫外纳米压印光刻的氟化混合物模板制备
Fabrication of Fluoridated Hybrid Replica Mold by UV Nanoimprinting Lithography
【摘要】 不同特征尺度和不同周期的氟化混合物软复制模板,通过使用硅主模板和紫外纳米压印光刻技术制备而成。与聚二甲基硅氧烷和其他聚合物材料相比,光刻胶具有优良的性能,如优良的机械强度、低表面能和良好的热稳定性等。在紫外和热纳米压印工艺中,主模板被用作印章。实验结果表明,转移到基底上的图案与主模板非常一致。所制备的氟化混合物复制模板不仅适用于紫外纳米压印,也适用于热纳米压印,并且所加工的复制模板还可被用于制备光电器件,以实现传感、成像、探测、通信和数据存储等领域中的相关功能。
【Abstract】 The fluoridated hybrid soft replica molds with different feature sizes and periods are fabricated with silicon master templates by UV nanoimprinting lithography(NIL).Compared with PDMS and other polymer materials,the photo-resist used here possesses excellent properties,such as good mechanism strength,low surface energy and thermal stability.The replica molds are used as stamps in UV and thermal nanoimprinting process.The experimental results show that the transferred patterns on the substrates are agreed well with the master molds.The fabricated fluoridated hybrid replica molds are not only the suitables for UV nanoimprinting,but also for thermal nanoimprinting,and the fabricated replica molds can also be used as photonics-based devices for sensing,imaging,detection,telecommunication and data storage,etc.
【Key words】 nanofabrication; nanoimprinting lithography; nanoimprinting machine; fluoridated hybrid soft replica mold;
- 【文献出处】 飞控与探测 ,Flight Control & Detection , 编辑部邮箱 ,2019年02期
- 【分类号】TN305.7;TN15
- 【下载频次】333