节点文献

基于紫外纳米压印光刻的氟化混合物模板制备

Fabrication of Fluoridated Hybrid Replica Mold by UV Nanoimprinting Lithography

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 胡克想王阳培华王庆康

【Author】 HU Kexiang;WANGYANG Peihua;WANG Qingkang;School of Information and Control Engineering,IoT Perception Mine Research Center,National Engineering Laboratory of Internet Application Technology in Mines,China University of Mining and Technology;National Key Laboratory of Micro/Nano Fabrication Technology,Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education,School of electronic information and electrical engineering,Shanghai Jiao Tong University;

【机构】 中国矿业大学信息与控制工程学院物联网(感知矿山)研究中心矿山互联网应用技术国家工程实验室上海交通大学电子信息与电气工程学院微米/纳米加工技术国家重点实验室薄膜与微细技术教育部重点实验室

【摘要】 不同特征尺度和不同周期的氟化混合物软复制模板,通过使用硅主模板和紫外纳米压印光刻技术制备而成。与聚二甲基硅氧烷和其他聚合物材料相比,光刻胶具有优良的性能,如优良的机械强度、低表面能和良好的热稳定性等。在紫外和热纳米压印工艺中,主模板被用作印章。实验结果表明,转移到基底上的图案与主模板非常一致。所制备的氟化混合物复制模板不仅适用于紫外纳米压印,也适用于热纳米压印,并且所加工的复制模板还可被用于制备光电器件,以实现传感、成像、探测、通信和数据存储等领域中的相关功能。

【Abstract】 The fluoridated hybrid soft replica molds with different feature sizes and periods are fabricated with silicon master templates by UV nanoimprinting lithography(NIL).Compared with PDMS and other polymer materials,the photo-resist used here possesses excellent properties,such as good mechanism strength,low surface energy and thermal stability.The replica molds are used as stamps in UV and thermal nanoimprinting process.The experimental results show that the transferred patterns on the substrates are agreed well with the master molds.The fabricated fluoridated hybrid replica molds are not only the suitables for UV nanoimprinting,but also for thermal nanoimprinting,and the fabricated replica molds can also be used as photonics-based devices for sensing,imaging,detection,telecommunication and data storage,etc.

【基金】 中央高校基础研究基金(2014QNA81);中国科技部国际合作项目(2012DFA11070)
  • 【文献出处】 飞控与探测 ,Flight Control & Detection , 编辑部邮箱 ,2019年02期
  • 【分类号】TN305.7;TN15
  • 【下载频次】333
节点文献中: 

本文链接的文献网络图示:

本文的引文网络