【摘要】 我国高端集成电路(IC)产业严重受限于落后的光刻制造装备技术和产业,2016年进口约2 271亿美元,制约了我国电子信息产业的升级,成为重大的国家安全隐患。习近平主席说"实践反复告诉我们,关键核心技术是要不来、买不来、讨不来的",2008年以来我国启动科技重大专项"极大規模集成电路制造装备及成套工艺"(02专项),展开IC光刻制造装备及工艺关健技术攻关。通过对国际上先进光刻设备制造企业知识产权战略研究,调研其专利形成的关键技术模块,寻找我国光刻制造业研发的潜在技术入口,提高创新起点,引导研发活动向具有自主创新的目标,集中力量在光刻机国际前沿技术上有所突破,创造更多的自主知识产权。更多还原

【Abstract】 China’s high-level integrated circuit(IC)industry is severely limited by the backward lithography manufacturing equipment technology and industry.In 2016,the total value of imported IC chips was about MYM227.1 billion US dollars,which restricted the upgrading of China’s electronic information industry and became a major national security risk.President Xi Jinping said,"Practice repeatedly tells us that the key technology cannot be acquired by purchase or begging."Since 2008,China has launched a major science and technology project"Very Large-Scale Integrated Circuit Manufacturing Equipment and Complete Sets of Technology"(02 Special Project)to tackle key problems in the technology of IC lithography manufacturing equipments and process.Through research on the intellectual property strategy of international advanced lithography equipment manufacturing enterprises,this paper investigates the key technology modules formed by their patents,seeks for potential technology entrances for lithography manufacturing research and development,improves the starting point of innovation,and guides research and development activities to independent innovation.The goal is to concentrate on making breakthroughs in the international cutting-edge technology of lithography machines and creating more independent intellectual property rights.更多还原