【摘要】 通过原子层沉积技术（ALD）在Si基片上制备厚度为20～60 nm的Al₂O₃薄膜,采用三维光学显微镜和透射电子显微镜分别分析了它们的表面粗糙度和微观形貌;采用自主研发的扫描电子显微镜/扫描探针显微镜（SEM/SPM）联合测试系统对样品薄膜进行了原位纳米压痕实验,基于Hertz弹性接触理论对其弹性模量进行分析,利用Hay模型消除基底对测量结果的影响,并对模型中由于压头形状不同产生的误差进行了修正,最终计算出薄膜的实际弹性模量值。实验结果表明:ALD制备的Al₂O₃薄膜为非晶态,表面粗糙度不随厚度的增大而增大。薄膜弹性模量值没有表现出明显的小尺寸效应,去基底效应后得到的弹性模量值为（175±10） GPa。同一压入比条件下,薄膜厚度越小基底效应越明显。更多还原

【Abstract】 Five Al₂O₃ nanofilms with thickness of 20—60 nm were deposited by atomic layer deposition（ALD）. The surface roughness and microstructure of the deposited Al₂O₃ nanofilms were characterized by three dimensional optical microscopy and transmission electron microscopy. The force-displacement curves captured by a hybrid scanning electron microscope/scanning probe microscope（SEM/SPM）system were analyzed based on Hertz’s theory of contact mechanics for the elastic modulus of Al₂O₃ nanofilms. The Hay model was used to eliminate the influence of the substrate on the measurement results, and the errors in the model due to the different shapes of the indenter were corrected. The results show that, ALD Al₂O₃ nanofilms is amorphous, and the surface roughness does not increase with the increase of thickness. The elastic modulus do not show obvious small size effect, and the measured value is（175±10） GPa. Under the same indentation ratio, the smaller the film thickness is, the more obvious the substrate effect is.更多还原