【摘要】 采用脉冲电镀法在Cu基体上制备Ni-W-P合金镀层,并通过单因素方法探讨电解液pH(1~3)、温度(40~80°C)、平均电流密度(1~7 A/dm~2)及脉冲频率(200~1000 Hz)对沉积速度、镀层结构及耐蚀性能的影响。采用扫描电子显微镜、X射线衍射和X射线能谱仪对镀层表面微观形貌、结构及元素组成进行分析。在3.5%NaCl(质量分数)溶液及土壤溶液中采用动电位极化曲线及电化学阻抗谱对镀层的耐蚀性能进行研究。结果表明:脉冲电镀Ni-W-P镀层具有良好的耐蚀性能,且脉冲电镀参数对镀层结构及耐蚀性能具有十分重要的影响。最优脉冲电镀Ni-W-P镀层参数如下:pH 2.0、温度60°C、平均电流密度4 A/dm~2、脉冲频率600 Hz。在最优脉冲电沉积参数条件下制备的Ni-W-P合金镀层具有优良的耐腐蚀性能(276.8 k?),其表面致密,无任何明显缺陷。更多还原

【Abstract】 Ni-W-P coatings were electrodeposited on copper substrates by pulse electroplating. Effects of electrolyte pH(1-3), temperature(40-80 °C), average current density(1-7 A/dm~2) and pulse frequency(200-1000 Hz) on deposition rate, structure and corrosion resistance performance of Ni-W-P coatings were studied by single factor method. Surface morphology, crystallographic structure and composition of Ni-W-P coatings were investigated by means of scanning electron microscopy, X-ray diffractometry and energy dispersive X-ray spectroscopy, respectively. Corrosion resistance performances of Ni-W-P coatings were studied by potentiodynamic polarization and electrochemical impedance spectroscopy in 3.5% Na Cl solution(mass fraction) and soil-containing solution. It was found that the pulse electroplated Ni-W-P coatings have superior corrosion resistance performance and the electroplating parameters significantly affect the structure and corrosion resistance performance of Ni-W-P coatings. The optimized parameters of pulse electroplating Ni-W-P coatings were as follows: pH 2.0, temperature 60 °C, average current density 4 A/dm~2, and pulse frequency 600 Hz. The Ni-W-P coating prepared under the optimized parameters has superior corrosion resistance(276.8 k?) and compact surface without any noticeable defect.更多还原