节点文献
单斜氧化铜薄膜的磁控溅射制备及表征
Growth and Property Characterization of Monoclinic CuO Coatings
【摘要】 采用磁控溅射,通过氧氩比的调制在玻璃衬底上沉积了单斜结构的Cu O薄膜,并重点研究了氧氩比对薄膜微结构及光学吸收边的影响。研究表明随着氧氩比的增加,薄膜逐渐从多相向单相转变,薄膜表面逐渐趋于光滑和平整,Cu O<-111>择优取向逐渐减弱。晶轴上的晶格畸变结果显示氧氩比对晶轴a,b和c的影响不尽相同。a,b轴上呈现的压应力均先明显增大然后变得稳定,而c轴上则呈现了压应力向拉应力的转变。氧氩比对晶格常数的影响反应了a,b和c轴上晶粒生长的各向异性。Cu O薄膜为直接带隙半导体,其1.9 e V附近的光学吸收边随着氧氩比的增加而略微蓝移,吸收边的蓝移归结于晶粒的量子尺寸效应。
【Abstract】 The monoclinic CuO films were deposited by magnetron sputtering on glass substrate.The effect of the O2/Ar ratio on the microstructures and optical properties was investigated with X-ray diffraction,scanning electron microscopy and spectrophotometer.The results show that the O2/Ar ratio had a major impact.To be specific,as the O2/Ar ratio increased,the poly-to mono-crystalline transition occurred,accompanied by a decrease of the <-111> preferential growth orientation; the CuO coatings,grown in anisotropic manner,became increasingly compact and smooth; the compressive stress along a-and b-axis changed in an increase-leveloff mode,while the compressive stress transited into tensile stress in c-axis; a slight blue-shift of the optical absorption edge near 1.9 e V of the direct-gap CuO semiconductor showed up,possibly because of quantum size effect of CuO grains.
【Key words】 CuO film; Magnetron sputtering; Oxygen-argon ratio; Microstructure;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2018年05期
- 【分类号】TB383.2
- 【被引频次】5
- 【下载频次】203