【摘要】 利用软光刻技术在凸面基底上制备了光栅结构.以此凸面基底上制备的光栅结构作为模板,利用静电场诱导光刻技术实现了凹面基底上光栅结构的制备.光栅模板结构的高度为5.3μm,线宽是6.25μm,高宽比达到0.85∶1.诱导成形光栅结构的高度为42μm,线宽是13.35μm,高宽比高于3∶1.结果表明借助静电场诱导光刻技术可以在曲面基底上利用小高宽比的微结构模板制备出大高宽比的微结构.更多还原

【Abstract】 The grating structures was prepared on convex substrate by soft lithography.The grating structure on the convex surface substrate was then used as a template.We fabricated the grating structure on a concave surface using electrostatic induced lithography.The height of the mold grating structure was 5.3μm,the stripe width was 6.25μm,and the aspect ratio was 0.85∶1.The height of the induced grating structure was 42μm,the stripe width was 13.35μm,and the aspect ratio was larger than3∶1.The results demonstrated that high aspect ratio microstructures can be obtained on curved surfaces by using electrostatic induced lithography utilizing a master with a much lower aspect ratio.更多还原