【摘要】 采用磁控溅射方法在取向为（110）的Pb(Mg_1/3Nb_2/3)_0.7Ti_0.3O₃（PMN-PT）单晶基片上制备了Ni薄膜材料.利用X射线衍射仪、原子力显微镜、扫描电子显微镜及磁学测量系统对样品结构、形貌及磁性进行表征;利用交流电压调控磁光克尔效应的测试方法对Ni/PMN-PT异质结的逆磁电效应进行了研究.结果表明,Ni薄膜表面颗粒平整、致密,异质结表现出良好的铁磁性.电致克尔回线和电致应变曲线显示了相似的蝴蝶形状,说明了应力诱导机制在异质结的逆磁电耦合中起主要作用.更多还原

【Abstract】 Thin films of Ni were grown on（110） cut single crystal Pb( Mg_1/3Nb_2/3)_0.7Ti_0.3O₃（ PMN-PT）substrates by magnetron sputtering. The structure,morphology and magnetic properties of the thin films were characterized by X-ray diffraction,atomic force microscopy,scanning electron microscopy and magnetic property measurement system,respectively. By using AC-mode magneto-optical Kerr effect（ MOKE） technique,the converse magnetoelectric effect of the Ni/PMN-PT heterostructure was characterized. The results show that the surface of the Ni thin film is smooth and the dense,and the heterostructure shows good ferromagnetism. The electric Kerr-V cure and the electrostrictive strain curve show a similar butterfly shape,and it is shown that the stress induction mechanism plays a major role in the converse magnetoelectric coupling of heterostructure.更多还原