节点文献

NaOH溶液对多孔硅后处理的研究

Research on porous sillcon core by NaOH solution

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 张红梅吕长武

【Author】 ZHANG Hong-mei;LV Chang-wu;Xinjiang Institute of Light Industry Technology;School of Physical Science and Technology,Xinjiang University;

【机构】 新疆轻工职业技术学院新疆大学物理科学与技术学院

【摘要】 用强碱溶液后处理多孔硅的方法常被用来打开表面孔洞,以便生物化学分子更好的进入孔洞而实现传感检测的目的。对于纳米多孔硅,碱溶液处理带来的孔洞直径的增加不可忽视,而对此的相关研究未见报道。本文用浓度分别为1、3和15m mol·L-1的NaOH溶液对多孔硅进行后处理研究,处理时间从1min到30min。用NaOH溶液处理以后的多孔硅,孔径大小会改变,从而孔隙率改变导致多孔硅的折射率改变。测量不同条件下后处理多孔硅的反射光谱时反射谱会发生平移。实验结果表明:单层多孔硅和多层多孔硅,随着处理时间增加,Na OH溶液浓度增大,反射谱波峰会向波长小的方向移动,即发生蓝移。当Na OH溶液浓度达到15m M,浸泡时间达到8min时,多孔硅结构遭到破坏。

【Abstract】 Alkali solution(such as Na OH and KOH) treatment of porous silicon is often used to open pores for biochemical molecules better access to achieve the purpose of sensing testing.For nano-porous silicon,the increase of pore diameter caused by alkali solution treatment can not be ignored,and the related research has not been reported. The porous silicon was treated with Na OH solution,with the concentration of 1,3 and 15 m M and the processing time from 1 min to 30 min.After treating porous silicon with Na OH solution,the size of the pores is changed,so that the change of the porosity causes the refractive index of the porous Si to change.Reflectance spectra of porous silicon were measured by measuring the post-treated porous silicon under different post-treat conditions. The experimental results show that the peaks of reflection spectra of both the single-layer porous silicon and multi-layer porous silicon move to the direction of small wavelength with the increase of treatment time and the concentration of Na OH solution.When the Na OH solution concentration reached 15 m M,immersion time reached8 min,the porous silicon structure was destroyed.

【关键词】 多孔硅Na OH溶液后处理
【Key words】 porous siliconNaOH solutionpost-treatment
  • 【文献出处】 化学工程师 ,Chemical Engineer , 编辑部邮箱 ,2018年03期
  • 【分类号】O613.72;TB383.4
  • 【被引频次】1
  • 【下载频次】72
节点文献中: 

本文链接的文献网络图示:

本文的引文网络