【摘要】 目的研究光照条件对光催化材料抗真菌性能检测结果的影响,为建立标准化的光催化材料抗真菌性能测试方法提供数据支持。方法采用365 nm荧光灯,比较相同光照时间时1.2、0.8和0.4 m W/cm~2光照强度下实验菌种经光照后的菌落生长情况来研究光照强度对光催化材料抗真菌性能检测结果的影响;比较24,38及48 h光照时间下的催化材料抗真菌性能来确定合适的测试时间;通过人员比对来验证上述流程的可重复性。结果采用365 nm的荧光灯,光照强度(0.4~0.8)m W/cm~2时,对实验菌种的生长活性没有影响,而1.2 m W/cm~2的光照强度则对菌种有一定的伤害;光照38 h时,光催化材料的抗真菌活性区分度最好,最适合做材料的光催化性能评价;采用上述实验结果,不同人员对同一个样品进行独立检测,光催化抗真菌活性的实验结果可重复。结论采用(0.4~0.8)m W/cm~2光照强度,光照时间38 h时,可以建立稳定可重复的光催化材料抗真菌性能的测试方法。该方法首次采用了贴膜法定量测试光催化材料的抗真菌性能,可有效填补我国在光催化材料抗真菌检测方法缺乏的问题,为光催化材料及产品抗真菌性能的标准化提供数据支持,也可为广大光催化材料的生产企业提供可靠的测试方法,有助于提高产业的技术水平。更多还原

【Abstract】 Objectives To investigate the effect of irradiation on the detection result of the antifungal activity induced by photocatalytic materials and to provide supportive data to establish a standardized detection procedure and to determine a proper intensity and time of irradiation for the detection of the antifungal activity of photocatalytic materials. Methods The antifungal activity of UV responsive photocatalytic materials was tested under three different levels of irradiation intensity( 1. 2,0. 8,0. 4 m W/cm2) within the same length of time by using a UV lamp with a wavelength of 365 nm. Three intervals( 24,38 and 48 h) were compared to determine the proper length of irradiation time. The repeatability and stability of this method was tested by independent tests performed by different personnel. Results The irradiation intensity from 0. 4 to 0. 8 m W/cm2 had no significant influence on the growth of the test fungi,while the irradiation intensity at 1. 2 m W/cm2 had certain harm to the strain. The best duration of discriminating antifungal activity and the most suitable test parameters was conducting the detection after 38 hours of light exposure under an irradiation intensity of( 0. 4 ~ 0. 8) m W/cm2. The result tested by different personnel groups proved that this experimental method was simple and feasible,and the photocatalytic antifungal activity value could be repeated. Conclusions A repeatable test method for the detection of the antifungal activity induced by photocatalytic materials could be established by using an irradiation intensity( of 0. 4 ~ 0. 8) m W/cm2 and irradiating for 38 h. It is the first time that a quantitative determination procedure for photocatalytic antifungal activity by using a film adhesion method was developed. It could effectively fill the blank of the detection method for the antifungal property of photocatalytic materials in China,also provide support data to establish a standard procedure and help to improve the technical level of photocatalytic industries.更多还原