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磁控溅射功率对玻璃基DLC薄膜的结构和硬度的影响
Effects of Sputtering Power on Structure and Hardness of DLC Thin Films Deposited on Glass Substrates
【摘要】 用直流-射频磁控溅射镀膜工艺,在不同的溅射功率条件下,制备了玻璃/Si C/DLC(diamond-like carbon)薄膜。通过X射线衍射仪(XRD)、共焦显微拉曼光谱仪(Raman)、场发射扫描电子显微镜(SEM)、纳米显微硬度仪,研究了DLC薄膜的组织结构、物相组成、表面形貌、维氏硬度。结果表明,随着功率的增大,ID/IG值先增大后减小,薄膜硬度呈现先增大后减小的趋势;当溅射功率为200 W时,ID/IG值为0. 56,镀膜玻璃的硬度值最大(830HV),相比未镀膜的玻璃基片,硬度值增加了23. 88%。
【Abstract】 Diamond/SiC/DLC thin films were deposited under different sputtering power ratio by DC/RF magnetron sputtering. The structures,phase composition,surface morphology and Vickers hardness of DLC films were researched by X-ray diffraction( XRD),confocal microscopy Raman spectroscopy( Raman),field emission scanning electron microscopy( SEM) and nanometer microhardness tester. The results show that the ID/IG value increases first and then decreases with the increase of power,and the hardness of the film increases first and then decreases. When the sputtering power is 200 W,the ID/IG value is 0. 56,DLC coated glass with the maximum hardness( 830 HV),compared to the uncoated glass substrate,the hardness value increased by 23. 88%.
【Key words】 DLC films; hardness; magnetron sputtering power; SiC buffer layer;
- 【文献出处】 硅酸盐通报 ,Bulletin of the Chinese Ceramic Society , 编辑部邮箱 ,2018年10期
- 【分类号】TB383.2
- 【被引频次】5
- 【下载频次】248