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磁控溅射功率对玻璃基DLC薄膜的结构和硬度的影响

Effects of Sputtering Power on Structure and Hardness of DLC Thin Films Deposited on Glass Substrates

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【作者】 刘翔赵青南张泽华李渊曾臻董玉红赵杰

【Author】 LIU Xiang;ZHAO Qing-nan;ZHANG Ze-hua;LI Yuan;ZENG Zhen;DONG Yu-hong;ZHAO Jie;State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology;Jiangsu Xiuqiang Glasswork Co.Ltd.;

【通讯作者】 赵青南;

【机构】 武汉理工大学硅酸盐建筑材料国家重点实验室江苏秀强玻璃工艺股份有限公司

【摘要】 用直流-射频磁控溅射镀膜工艺,在不同的溅射功率条件下,制备了玻璃/Si C/DLC(diamond-like carbon)薄膜。通过X射线衍射仪(XRD)、共焦显微拉曼光谱仪(Raman)、场发射扫描电子显微镜(SEM)、纳米显微硬度仪,研究了DLC薄膜的组织结构、物相组成、表面形貌、维氏硬度。结果表明,随着功率的增大,ID/IG值先增大后减小,薄膜硬度呈现先增大后减小的趋势;当溅射功率为200 W时,ID/IG值为0. 56,镀膜玻璃的硬度值最大(830HV),相比未镀膜的玻璃基片,硬度值增加了23. 88%。

【Abstract】 Diamond/SiC/DLC thin films were deposited under different sputtering power ratio by DC/RF magnetron sputtering. The structures,phase composition,surface morphology and Vickers hardness of DLC films were researched by X-ray diffraction( XRD),confocal microscopy Raman spectroscopy( Raman),field emission scanning electron microscopy( SEM) and nanometer microhardness tester. The results show that the ID/IG value increases first and then decreases with the increase of power,and the hardness of the film increases first and then decreases. When the sputtering power is 200 W,the ID/IG value is 0. 56,DLC coated glass with the maximum hardness( 830 HV),compared to the uncoated glass substrate,the hardness value increased by 23. 88%.

【基金】 国家“十三五”重点研发计划子课题(2016YFB0303903-04)
  • 【文献出处】 硅酸盐通报 ,Bulletin of the Chinese Ceramic Society , 编辑部邮箱 ,2018年10期
  • 【分类号】TB383.2
  • 【被引频次】5
  • 【下载频次】248
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