【摘要】 采用直流反应磁控溅射法在FTO玻璃基片上沉积了不同厚度的氧化镍(NiO)薄膜。用X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)、X射线光电子能谱仪(XPS)、台阶仪、紫外可见分光光度计、电化学工作站,研究了NiO薄膜厚度对其微观结构、形貌,以及电致变色性能的影响。结果表明,随着溅射时间增加,NiO薄膜厚度增加,试样的初始态可见光谱透过率逐渐降低,(200)晶面的XRD衍射峰强度逐渐增加;以1 M KOH溶液作为电解质,随着NiO薄膜厚度增加,薄膜电荷储存量逐渐增大。NiO薄膜厚度为920 nm的试样着色效率最高,达到了23.46 cm2/C;80 nm厚度的薄膜试样光学调制幅度最大,波长550 nm处为40.85%。薄膜越厚,着、褪色时间越长;所有试样着色时间均大于褪色时间,80 nm厚度的薄膜试样的着色、褪色时间最快,分别为4.47 s和2.28 s。更多还原

【Abstract】 Nickel Oxide( NiO) thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique. Structural and electrochromic properties of NiO films as a function with various thickness were investigated by using X-ray diffraction, scanning electron microscope,X-ray photoelectron spectroscopy, step profiler, spectrophotometer and electrochemical workstation. XRD analysis revealed that( 200) is the preferred orientation,and the peak intensity increases with thickness suggesting an improvement of the crystallinity. The transmittance of as-deposited films decreased as the thickness of films increased. Using 1 M KOH for electrolyte,the charge capacity increases with thickness. The coloration efficiency increases with thickness,reaching 23. 46 cm~2/C for the sample with 920 nm after 30 cycles. Transmittance modulation of NiO films reaches 40. 85% at 550 nm for the sample with 80 nm. We used chronoamperometry to calculate coloration/bleaching time of NiO films,and coloration time was long than bleaching time for all the samples. Coloration and bleaching time increases with thickness,and they are 4. 47 s and 2. 28 s for the sample with 80 nm,respectively.更多还原