TM AH anisotropic wet etching was applied for the fabrication of ITPN( invert truncated pyramid notch) on P( 100)silicon substrate,and then the silicon micro-tip array was prepared using HF anode electrochemical etching. In order to investigate the formation process,asilicon micro-tip formation model was developed based on the formation mechanism of Ntype porous silicon.The relationships among the geometrical structure parameters of the micro-tip were studied. The results indicate that the formation of micr...
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