节点文献

Ion property and electrical characteristics of 60MHz very-high-frequency magnetron discharge at low pressure

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 蒋阿敏叶超王响英朱敏张苏

【Author】 Amin JIANG;Chao YE;Xiangying WANG;Min ZHU;Su ZHANG;School of Physics Science and Technology, Soochow University;Key Laboratory of Thin Films of Jiangsu Province, Soochow University;Medical College, Soochow University;

【机构】 School of Physics Science and Technology, Soochow UniversityKey Laboratory of Thin Films of Jiangsu Province, Soochow UniversityMedical College, Soochow University

【摘要】 The pre-ionized 60 MHz very-high-frequency(VHF) magnetron discharge at low pressure,assisted by inductively coupled plasma(ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer.The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF(60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.

【Abstract】 The pre-ionized 60 MHz very-high-frequency(VHF) magnetron discharge at low pressure,assisted by inductively coupled plasma(ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer.The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF(60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.

【基金】 supported by National Natural Science Foundation of China (Nos. 11675118 and 11275136)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2018年10期
  • 【分类号】TB383.2
  • 【下载频次】11
节点文献中: 

本文链接的文献网络图示:

本文的引文网络