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电解蚀刻法制备印制电路板精细线路的工艺优化

Optimization of electrolytic etching process for preparing fine lines of printed circuit board

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【作者】 付登林陈际达鲁蓝锶廖超慧文亚男嫣婷覃新陈世金何为

【Author】 FU Deng-lin;CHEN Ji-da;LU Lan-si;LIAO Chao-hui;WEN Ya-nan;YAN Ting;QIN Xin;CHEN Shi-jin;HE Wei;School of Chemistry and Chemical Engineering, Chongqing University;

【通讯作者】 陈际达;

【机构】 重庆大学化学化工学院江苏博敏电子股份有限公司梅州博敏电子股份有限公司电子科技大学能源与材料学院

【摘要】 以蚀刻因子为指标,通过正交试验对电解蚀刻法制备印制电路板(PCB)精细线路的工艺参数进行优化,得到电解蚀刻的最优条件为:2,5-二巯基-1,3,4-噻二唑(DMTD)15 mg/L,CuCl2 30 g/L,HCl 0.48 mol/L,阳极电流密度2.4 A/dm2。在最优工艺条件下,蚀刻因子平均达到7.53,所得PCB精细线路平整均匀,无毛边、短路、断路等缺陷,阴极同步回收得到的铜板呈赤红色,回收率为47.67%。

【Abstract】 The parameters of electrolytic etching process for preparing fine lines of printed circuit board(PCB) were optimized through orthogonal test using etching factor as indicator. The optimal conditions of electrolytic etching are as follows: 2,5-dimercapto-1,3,4-thiadiazole(DMTD) 15 mg/L, CuCl2 30 g/L, HCl 0.48 mol/L, and anodic current density 2.4 A/dm2. The average etching factor under the optimal conditions reached 7.53, the fine lines obtained on PCB were level and uniform without defects such as rough edge, short circuit, and broken circuit. The copper plate simultaneously reclaimed at the cathode was reddish with a recovery of 47.67%.

【基金】 2015年广东省“扬帆计划”先进印制电路关键技术研发及产业化项目(2015YT02D025)
  • 【文献出处】 电镀与涂饰 ,Electroplating & Finishing , 编辑部邮箱 ,2018年23期
  • 【分类号】TN41
  • 【被引频次】3
  • 【下载频次】175
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