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基于Lab Windows/CVI的真空镀膜设备的控制系统开发

Development of Control System for Vacuum Coating Equipment Based on Lab Windows/CVI

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【作者】 康豪宋一凡宣科刘功发

【Author】 KANG Hao;SONG Yi-fan;XUAN Ke;LIU Gong-fa;National Synchrotron Radiation Laboratory, University of Science and Technology of China;

【机构】 中国科学技术大学国家同步辐射实验室

【摘要】 真空镀膜技术是目前具有良好发展前景的一项技术,在工业领域具有重要的作用。本文以安徽纯源真空镀膜科技有限公司生产的真空镀膜设备PIS-212的控制系统为例,介绍了一种基于Lab Windows/CVI开发平台的控制系统解决方案,该方案具有开发快速高效、人机界面友好、"一键式"操作方式和功能丰富齐全的特点。

【Abstract】 Vacuum coating is important in modern industry due to its potential advantages. In this work, to introduce a solution of the control system based on Lab Windows/CVI, the PIS-212 deposition system of Anhui Chun-yuan Vacuum Coating Technology Company was taken to as an example. The result shows that, the control system responses quickly with friendly human-machine interface, one-button automatic operation and plentiful functions.

  • 【分类号】TP273;TB43
  • 【被引频次】2
  • 【下载频次】104
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