【摘要】 二硫化钼是一种类似于"三明治"结构的二维片层结构,这种特殊的结构造就了其优异的物理化学性能,具有较大的理论研究意义。本次实验运用低温氧等离子体对机械剥离的单层二硫化钼薄膜进行改性处理,研究控制处理时间不同的条件对二硫化钼薄膜的均匀度和表层电荷的影响。拉曼光谱图显示处理后的二硫化钼薄膜的E12g峰和A1g向右发生了明显的偏移,表明引入了N型掺杂。运用原子力显微镜探究材料形貌、相位和表面电荷的变化,从形貌图发现低温氧等离子体处理后的表面粗糙度有了明显的增加;原子力显微静(AFM)的相位图表明样品的均匀度以一定的规律变小;根据(AFM)表层电荷分布图,观察到低温氧等离子体处理后样品表层电荷随处理时间的增加而增加,当改性时间在40 s时,样品表层电荷全部消失。更多还原

【Abstract】 Herein,we reported the property characterization of the cleaved natural MoS₂ monolayer modified with low temperature oxygen plasma.The influence of the Oxygen Plasma oxidation time on the microstructures and electronic structures of MoS₂ monolayer was investigated with Raman spectroscopy and atomic force microscopy.The results show thatdepending on the oxidation time,the Oxygen Plasma strongly affects the properties of MoS₂ monolayer.For example,the Oxygen Plasma oxidation resulted in a considerable blue-shift of E12 gand A1 gpeaks,indicating a N-type doping; as the oxidation time increased,the surface roughness markedly increased and the surface charge density gradually decreased,being completely removed after Oxygen Plasma oxidation for 40 s,possibly because of formation of Mo-O bond and adsorption of O^2- ions.Moreover,the Oxygen Plasma oxidation has a major impact on the mechanical and electrical properties of MoS₂ monolayer.更多还原