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Investigation of the surface orientation influence on 10-nm double gate GaSb nMOSFETs

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【作者】 邸绍岩沈磊伦志远常鹏鹰赵凯卢朓杜刚刘晓彦

【Author】 Shaoyan Di;Lei Shen;Zhiyuan Lun;Pengying Chang;Kai Zhao;Tiao Lu;Gang Du;Xiaoyan Liu;Institute of Microelectronics,Peking University;School of Information and Communication,Beijing Information Science and Technology University;CAPT,HEDPS,IFSA Collaborative Innovation Center of Ministry of Education,LMAM & School of Mathematical Sciences,Peking University;

【机构】 Institute of Microelectronics,Peking UniversitySchool of Information and Communication,Beijing Information Science and Technology UniversityCAPT,HEDPS,IFSA Collaborative Innovation Center of Ministry of Education,LMAM & School of Mathematical Sciences,Peking University

【摘要】 The performance of double gate GaSb nMOSFETs with surface orientations of(100) and(111) are compared by deterministically solving the time-dependent Boltzmann transport equation(BTE).Results show that the on-state current of the device with(111) surface orientation is almost three times larger than the(100) case due to the higher injection velocity.Moreover,the scattering rate of the(111) device is slightly lower than that of the(100) device.

【Abstract】 The performance of double gate GaSb nMOSFETs with surface orientations of(100) and(111) are compared by deterministically solving the time-dependent Boltzmann transport equation(BTE).Results show that the on-state current of the device with(111) surface orientation is almost three times larger than the(100) case due to the higher injection velocity.Moreover,the scattering rate of the(111) device is slightly lower than that of the(100) device.

【基金】 Project supported by the National Natural Science Foundation of China(Grant Nos.61674008,61421005,and 61404005)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2017年04期
  • 【分类号】TN386
  • 【下载频次】19
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