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化学亚胺化程度对正性光敏聚酰亚胺影响
Effect of the Degree of Chemical Imidization on the Positive Photosensitive Polyimide
【摘要】 选用2,2′-双三氟甲基-4,4′-联苯二胺(TFDB)与二苯醚四甲酸二酐(ODPA)作为聚合物的基本骨架进行缩聚反应生成聚酰胺酸,再经过化学亚胺化得到可溶性聚酰亚胺(PI)。通过调节2-甲基吡啶在亚胺化试剂中的含量以达到控制酰亚胺化程度的目的,探讨不同亚胺化程度的PI胶的显影性能。结果表明,当n(2-甲基吡啶)∶n(乙酸酐)=1∶5时,所合成的光敏聚酰亚胺的显影性能最优。
【Abstract】 Condensation polymerization of 2,2′-bis(trifluoromethyl)-4,4′-diamino biphenyl(TFDB)and 3,3′,4,4′-tetracarboxydiphthalic ether dianhydride(ODPA)gives a soluble polyimide.The effect of the degree of chemical imidization on positive photosensitive polyimide performance was investigated by adjusting the content ofα-picoline in the imidization reagent to control the extent of the imide.The results show that the photosensitive polyimide has the best developing performance when the mole ratio ofα-picoline to acetic anhydride is 1to 5in the process of chemical imidization.
【Key words】 positive photosensitive polyimide; chemical imidization; solubility; photolithography;
- 【文献出处】 应用化学 ,Chinese Journal of Applied Chemistry , 编辑部邮箱 ,2017年03期
- 【分类号】TQ323.7
- 【被引频次】7
- 【下载频次】409