High-power impulse magnetron sputtering(Hi PIMS),a new physical vapor deposition technique which combines the advantages of the high ionization rates of the sputtered materials and control of electromagnetism,has been widely used to deposit high-performance coatings with a large density and high adhesion.However,Hi PIMS has some intrinsic disadvantages such as the low deposition rate,unstable discharge,and different ionization rates for different materials thereby hampering wider industrial adoption.We have...