High-power impulse magnetron sputtering(Hi PIMS),a new physical vapor deposition technique which combines the advantages of the high ionization rates of the sputtered materials and control of electromagnetism,has been widely used to deposit high-performance coatings with a large density and high adhesion.However,Hi PIMS has some intrinsic disadvantages such as the low deposition rate,unstable discharge,and different ionization rates for different materials thereby hampering wider industrial adoption.We have...
| 
推荐 
点击下列相关研究机构和相关文献作者，可以直接查到这些机构和作者被《中国知识资源总库》收录的其它文献，使您全面了解该机构和该作者的研究动态和历史。
