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PbTe(111)薄膜的分子束外延生长及其表面结构特性
Molecular Beam Epitaxy Growth and Surface Structural Characteristics of Pb Te(111) Thin Film
【摘要】 采用分子束外延(MBE)方法在Ba F2(111)衬底上直接外延生长了Pb Te薄膜。反射高能电子衍射(RHEED)实时监控的衍射图样揭示了Pb Te在Ba F2(111)表面由三维生长向二维生长的变化过程。转动对称性的研究结合第一性原理密度泛函理论(DFT)的计算揭示了在富Pb及衬底温度(Tsub)为350°C的生长条件下,得到的Pb Te(111)薄膜具有稳定的(2×1)重构表面。Pb Te(111)-(2×1)表面覆盖Te膜后,通过300°C的退火处理,重构表面可完全复原,这为大气环境下Pb Te薄膜表面结构的保护提供了有效的方法。
【Abstract】 Pb Te thin films were epitaxially grown on Ba F2(111) substrate using molecular beam epitaxy(MBE).In situ characterization by reflection high energy electron diffraction(RHEED) revealed a transition of the growth mode from 3D to 2D. Rotational symmetry studies combined with first principles density functional theory(DFT)calculations revealed that under Pb-rich and 350 °C substrate temperature(Tsub) growth conditions, stable(2 × 1) reconstructions appear on the Pb Te(111) surface. When the surface of Pb Te(111)-(2 × 1) was covered with Te, the stable(2 × 1) reconstructions could be retrieved under 300 °C annealing. This provides an effective method for the protection of Pb Te film surfaces from the atmospheric environment.
【Key words】 Surface reconstruction; DFT; RHEED; Rotational symmetry; PbTe thin film;
- 【文献出处】 物理化学学报 ,Acta Physico-Chimica Sinica , 编辑部邮箱 ,2017年02期
- 【分类号】TB383.2
- 【被引频次】2
- 【下载频次】152