【摘要】 为了研究调制比对ZrN/NbB₂多层薄膜结构与力学性能的影响,采用超高真空射频磁控溅射技术在Si（100）基底表面上沉积合成具有不同调制比的ZrN/NbB₂多层薄膜,并利用X线衍射仪器（XRD）、表面轮廓仪（XP-2）和纳米压痕仪分别对ZrN/NbB₂薄膜的结构特征以及硬度、应力、弹性模量和结合力等机械性能进行研究.结果表明:不同调制比的ZrN/NbB₂多层薄膜结构中均出现了Nb B2（001）、Nb B2（002）和Zr N（111）衍射峰.随着调制比tZr N∶tNb B2从2∶1变化为1∶4,ZrN/NbB₂纳米多层膜的硬度和弹性模量均呈现先增后减的变化趋势,且在t_ZrN∶t_NbB2=2∶3时,多层膜硬度和弹性模量分别达到39.29 GPa和428.47 GPa的最大值.更多还原

【Abstract】 In order to study the effect of modulation ratio on the structure and mechanical properties of ZrN/NbB₂ multilayers,ZrN/NbB₂ multilayered films with various modulation ratios were synthesized on Si（100）substrates by ultrahigh vacuum rf magnetron sputtering system. X-ray diffraction（XRD）,profiler（XP-2）and nano indenter system were employed to investigate crystal structure,hardness,residual stress,elastic modulus and adhesion of ZrN/NbB₂ multilayered films. The results show that the mixed textures of NbB₂（001）,NbB₂（002）and ZrN（111）appear in all the microstructure of the ZrN/NbB₂ multilayered films with various modulation ratios. The hardness and elastic modulus of ZrN/NbB₂ nano multilayered films increase firstly,and then decrease with the modulation ratio(t_ZrN∶t_NbB2)changed from 2 ∶1 to 1 ∶ 4,and hardness and elastic modulus of multilayers are up to the maximum value（39.29 GPa and 428.47 GPa）at t_ZrN∶t_NbB2= 2 ∶ 3.更多还原