【摘要】 利用自制抛光液对微晶玻璃进行化学机械抛光,研究络合剂、氧化剂、润滑剂种类及添加量对微晶玻璃化学机械抛光材料去除速率和表面粗糙度的影响。结果表明:抛光液中加入质量分数0.2%的EDTA络合剂后,能大幅降低材料表面粗糙度;加入质量分数2%的过硫酸铵氧化剂后能得到较光滑的材料表面和较高的材料去除速率;加入质量分数为0.2%的丙三醇润滑剂后能降低材料表面粗糙度。将EDTA络合剂、过硫酸铵氧化剂丙、三醇润滑剂加入SiO₂抛光液中对微晶玻璃进行化学机械抛光,利用原子力显微镜观察抛光微晶玻璃抛光前后的表面形貌。结果表明,抛光后微晶玻璃表面极为平整,达到了0.12 nm的纳米级光滑表面,且材料去除速率达到72.8 nm/min。更多还原

【Abstract】 Chemical mechanical polishing experiments of glass ceramics substrates were carried out by using self-made polishing liquid to investigate the effects of the species and the concentration of complexing agent,the kinds of oxidant,the species and the concentration of lubricant on the material removal rate and the surface roughness. The experimental results reveal that the surface roughness can be significantly reduces by adding EDTA with 0. 2% mass fraction,the higher material removal rate and the more smooth surface can be obtained by adding（ NH₄）₂ S₂ O₈ with 2% mass fraction,and the surface roughness can be reduced by adding glycerol with 0. 2% mass fraction. Glass ceramics substrates were polished by SiO₂ slurry which consisted of EDTA,（ NH₄）₂S₂ O₈ and glycerol. The surface roughness of the glass ceramics substrates before and after being polished was characterized by atomic force microscope（ AFM）. The result shows that the surface of the glass ceramics is very smooth,the surface roughness is 0. 12 nm after polishing,and the material removal rate reaches 72. 8 nm/min.更多还原