【摘要】 采用多弧离子镀和磁控溅射复合技术在304不锈钢基体表面制备了Ti CN与Ti N薄膜,研究了工艺参数中氮分压对Ti CN薄膜表面形貌、粗糙度、沉积速率、物相结构、力学性能的影响规律。结果表明:不同氮分压下所制备的Ti CN薄膜表面平整、致密,氮分压对表面形貌影响不大;随着氮分压的升高,Ti CN薄膜的表面粗糙度先减小后增加,在0.4 Pa时达到最小值为0.185μm,而沉积速率一直降低。Ti CN薄膜主要由fcc-Ti N型Ti CN相组成,随着氮分压的增大出现(111)晶面择优取向;薄膜的显微硬度先增大后减小,在氮分压0.4 Pa时为3008 HV0.025,而膜基结合力呈线性上升趋势。Ti CN薄膜的耐磨性优于Ti N薄膜,且薄膜的平均摩擦因数随着氮分压的增加不断降低,抗摩擦磨损性能逐渐增强,在氮分压为0.4 Pa时,薄膜平均摩擦因数与磨损率分别为0.335和5.53×10-6mm3·N-1·m-1,具有更好的耐磨性。更多还原

【Abstract】 Ti CN and Ti N films were deposited on 304 stainless steel substrate by composite ion plating combining multiarc ion plating and magnetron sputtering technique. The effect of nitrogen partial pressure on the surface morphology,roughness,deposition rate,phase structure,and mechanical properties of Ti CN films were investigated. The results show that Ti CN films as-deposited are smooth and dense,and the nitrogen partial pressure has little effect on it. As the nitrogen partial pressure increases,the surface roughness of Ti CN films first decreases then increases,rising up to the minimum value 0. 185 μm at 0. 4 Pa,and the deposition rate always reduces. Ti CN films are mainly composed of Ti CN phase with fcc-Ti N structure that presents the( 111) preferred orientation with the increase of nitrogen partial pressure. The microhardness of films first reaches 3008 HV0. 025 at 0. 4 Pa then decreases while the adhesion strength of films displays a linear ascending trend with increasing nitrogen partial pressure. The wear resistance of Ti CN films is better than that of Ti N films and the average friction coefficient of films decreases continually with increasing nitrogen partial pressure,implying that the anti-friction and wear property of films gradually intensifies. When the nitrogen partial pressure is 0. 4 Pa,the Ti CN film expresses optimal wear resistance,with the average coefficient and the wear rate being 0. 335 and 5. 53 × 10-6 mm3·N-1·m-1,respectively.更多还原