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印制线路板上硫氰酸亚金钾体系化学镀金

Electroless gold plating on printed circuit board in potassium gold(Ⅰ) thiocyanate bath

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【作者】 陈易罗洁钟迪元董振华李德良

【Author】 CHEN Yi;LUO Jie;ZHONG Di-Yuan;DONG Zhen-hua;LI De-liang;College of Environmental Science and Engineering, Central South University of Forestry and Technology;

【机构】 中南林业科技大学环境科学与工程学院湖南荣伟业电子材料科技公司东莞市道诚绝缘材料有限公司

【摘要】 以硫氰酸亚金钾[KAu(SCN)2]为金源对镀镍印制线路板进行化学镀金。采用单因素试验研究了镀液中Au+含量、硫氰酸铵含量、pH和温度对沉金速率、金层外观和结合力的影响,得到最优配方和工艺参数为:Au+2.0 g/L,硫氰酸铵15 g/L,添加剂Cy-808 150 mL/L,pH 3.0,温度50℃。在此条件下沉金速率约为6 nm/min,结晶均匀细致,呈光亮的金黄色。

【Abstract】 Electroless gold plating was conducted on the surface of nickel-plated printed circuit board using potassium gold(Ⅰ) thiocyanate [KAu(SCN)2] as main salt. The effects of Au+ and ammonium thiocyanate contents, as well as pH and temperature of the bath on deposition rate, appearance and adhesion of gold coating were studied by single-factor experiment. The optimal bath composition and process parameters were obtained as follows: Au+ 2.0 g/L, ammonium thiocyanate 15 g/L, additive Cy-808 150 m L/L, temperature 50 ℃, and pH 3.0. The gold deposition rate under the given process conditions is ca.6 nm/min. The obtained gold coating is uniform, compact, bright and golden yellow.

【基金】 国家自然科学基金(20976201);湖南省自然科学基金(07JJ6156);国家教委留学回国人员资助项目(2004184)
  • 【文献出处】 电镀与涂饰 ,Electroplating & Finishing , 编辑部邮箱 ,2017年07期
  • 【分类号】TN41
  • 【被引频次】4
  • 【下载频次】135
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