【摘要】 目的研究低温条件下高折射率锐钛矿结构TiO₂薄膜的制备条件及影响因素。方法用直流磁控溅射技术（DCMS）和改进的直流磁控溅射技术（能量过滤磁控溅射技术,EFMS）制备TiO₂薄膜。采用正交试验方法研究DCMS技术工艺参数对TiO₂薄膜的影响,确定了低温制备高折射率锐钛矿TiO₂的最优制备条件,在该最优制备条件下,又采用FEMS技术制备了TiO₂薄膜,并对比两种技术制备的薄膜。TiO₂薄膜的微结构用X射线衍射和Raman光谱衍射进行表征,样品的表面形貌用扫描电镜SEM进行观察,薄膜的光学特性用椭偏光谱仪测试、拟合处理得到。结果在较低的温度100℃下,利用DCMS和EFMS技术制备的TiO₂薄膜具备良好的单一锐钛矿结构。EFMS技术制备TiO₂的孔隙率为4.7%,550 nm处的折射率为2.47,平均晶粒尺寸为12.5 nm。经计算,DCMS和EFMS技术制备的TiO₂薄膜的光学带隙分别为3.08 e V和3.37 e V。结论利用DCMS技术和EFMS技术可在低温制备出锐钛矿TiO₂薄膜,EFMS技术制备的薄膜孔隙率较低,折射率较高,晶粒较均匀细小,光学带隙较大。更多还原

【Abstract】 The work aims to study preparing conditions and influencing factors of anatase TiO₂ film of high refractive index at low temperature. Direct current magnetron sputtering（DCMS） technique and improved energy filtering magnetron sputtering（EFMS） technique were used to prepare TiO₂ film. Effects of process parameters of DCMS technology on TiO₂ film were studied in orthogonal experimental method, optimal preparation conditions of anatase TiO₂ film of high refractive index at low temperature was determined. TiO₂ films were deposited by taking advantage of EFMS technique under the optimal preparation conditions, and films prepared by two techniques were compared as well. Microstructure of TiO₂ film was characterized with X-ray diffractometer and Raman spectrometer, surface morphology was observed with scanning electron microscope and optical property was determined and fit with spectroscopic ellipsometer. The TiO₂ films prepared by DCMS and EFMS techniques had excellent single anatase structure at 100 ℃. Porosity of TiO₂ prepared by EFMS technique was 4.7%, refractive index at 550 nm was 2.47 and average crystal size was 12.5 nm. Optical bandgap of the TiO₂ films deposited by the DCMS and EFMS techniques was 3.37 e V and 3.08 e V, respectively. TiO₂ films can be prepared at low temperature by DCMS and EFMS techniques. Films prepared by the latter feature in smaller porosity, high refractive indexes, fine and well-distributed grain and large optical bandgap.更多还原