【摘要】 提出了一种利用反应扩散刻蚀将石英玻璃表面的Cr/Cu掩膜层图形化,然后通过各向同性湿法刻蚀制备陷光阵列结构的加工工艺。将此陷光结构用于硅叠层薄膜太阳电池表面可以降低光的反射,提高太阳电池光电转换效率。实验结果表明:在350~1 100 nm的波长范围内,与表面光滑玻璃结构硅叠层薄膜太阳电池相比,太阳电池光电转换效率达到10.08%,相对提高了3.07%;玻璃表面的平均反射率由9.13%下降到8.87%,制备获得的表面具有浴盆形状微凹坑阵列结构的玻璃片平均透射雾度达到了49.45%,将该浴盆形状微凹坑阵列结构覆盖单晶硅测试后,电池表面平均反射率由27.15%下降到22.28%。提出的利用反应扩散刻蚀工艺在玻璃表面制备陷光阵列结构的方法,将有望应用于硅叠层薄膜太阳电池表面实现减反,提高太阳电池效率。更多还原

【Abstract】 A fabrication process for the fabrication of the light trapping array structure via the isotropic etching method by patterning the Cr/Cu mask layer on the glass substrate surface with reaction diffusion etching was presented.The reflectance of light can be reduced and the photonto-electron conversion efficiency of the solar cells can be enhanced with the light trapping structure applied to the surface of the silicon laminated thin film solar cells.The experimental result shows that within the wavelength range of 350-1 100 nm,the photon-to-electron conversion efficiency of the solar cells can be enhanced up to 10.08%,which is relatively 3.07%larger than that of the laminated thin film solar cells with the smooth glass.Simultaneously,the average reflectance of the glass surface reduces from9.13%to 8.87%,and the average transmission haze of the prepared glass sheet with the surface of the tub-shape micro-pit array structure is up to49.45%.The test result indicates that the average surface reflectance of the cells tub array structure reduces to 22.28%from27.15% by covering the crystalline silicon on the tub-shape micropit array structure.The proposed fabrication method for the light trapping array structure on the glass via the reaction-diffusion etching process can be widely used as an antireflection structure of the silicon laminated thin film solar cell to enhance the solar cell efficiency.更多还原