节点文献
等离子体电弧高温处理金刚石自支撑膜的强度和缺陷
Strength and defects of free-standing diamond films after plasma arc high temperature treatment
【摘要】 为了适应高速气动强烈冲击对金刚石自支撑膜光学窗口强度的需要,提出了等离子体电弧高温处理金刚石自支撑膜以提高其强度的方法,对直径100mm的金刚石自支撑膜进行低气压电弧高温处理并抛光,获得了无裂纹的光学级金刚石自支撑膜。应用扫描电镜、拉曼光谱、正电子湮没技术和光致发光谱对金刚石自支撑膜进行表面形貌及缺陷分析,讨论了Ar和H在电弧处理中的作用。结果表明:等离子体处理对不同强度金刚石自支撑膜的强度提高幅度不一,最高可达71.6%;电弧处理后空位浓度相对降低,空位和N杂质形成了更多的复合体。,金刚石膜中N杂质与空位结合生成了更多的[N-V]0和[N-V]-是强度提高的重要原因。光学级金刚石自支撑膜强度的提高为长波红外光学窗口材料在超高音速的应用提供了重要基础。
【Abstract】 In order to adapt to high speed pneumatic strong impact on the needs of the diamond optical window,the plasma arc treatment of rapid heating is put forward to improve the fracture strength of free-standing diamond films.The polished freecracks optical-grade diamond films with the diameter of 100 mm were obtained after plasma arc treatment.The effects of plasma high temperature annealing treatment on vacancy defects,impurities,morphology and fracture strength of free-standing diamond films are investigated by laser Raman spectrum,positron annihilation technique(PAT),photoluminescence(PL),scanning electron microscope(SEM)and mechanical property tester.And the role of Ar and H are discussed in arc processing.Results indicate that the fracture strength on different levels of the diamond films are different,the highest can be increased up to 71.6%.PAT and PL results indicate that the vacancy concentration relatively decreases and the recombination of N impurity and vacancy increases after plasma treatment.The formation of more[N-V]0and [N-V]-clusters is one important reason for strength increase.The mechanical enhancement of optical-grade free-standing diamond film is an important support of the application to hypersonic flight far infrared window.
【Key words】 plasma arc; free-standing diamond films; strength; defects;
- 【文献出处】 中国科技论文 ,China Sciencepaper , 编辑部邮箱 ,2016年10期
- 【分类号】TQ163;TB383.2
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