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铀表面中频磁控溅射离子镀铝的组织结构与界面特性研究
Microstructure and interfacial characteristic of Al coating prepared by MFMSIP on depleted Uranium surface
【摘要】 采用中频磁控溅射离子镀技术在贫铀表面以不同脉冲偏压制备了铝镀层,利用X射线衍射仪和扫描电镜对镀层的组织结构进行了表征,利用扫描电镜与俄歇电子能谱仪对镀层与基体的界面特性进行了研究。结果表明:铝镀层为面心立方结构;镀层平整、致密,与基体结合良好且具有"伪扩散层";偏压对镀层的组织结构影响显著,随着偏压的升高,镀层在(200)(220)晶面生长增强;在低偏压时镀层呈板块状结构,随着偏压的升高,镀层向柱状结构转化。
【Abstract】 Aluminium coating was prepared by middle frequency magnetron sputtering ion plating(MFMSIP) technology at different pulse bias voltages on depleted Uranium surface. The film microstructure was characterized by the X-ray diffractor and scanning electron microscope(SEM). The interfacial characteristic between aluminium and uranium was studied by SEM and Auger electron spectroscopy. The results indicate that the aluminium coating crystalline structure is face centered cubicstructure and the aluminium coating is smooth and compact, which is well adhered to uranium substrate tightly with "Pseudo-diffusion layer" presented in interfacial zone. The bias voltages can affect the coating microstructure obviously. With increasing of bias voltage, the growth of aluminium coating on(200) and(220) crystalline face was enhanced. The aluminium coating had bulk structure at lower bias voltage and then changed to columnar structure.
【Key words】 Depleted Uranium; Aluminium coating; MFMSIP; Microstructure; Interfacial characteristic;
- 【文献出处】 真空 ,Vacuum , 编辑部邮箱 ,2016年04期
- 【分类号】TQ153
- 【被引频次】1
- 【下载频次】86