The fringe pattern phase analysis method is proposed for the tilt correction in the plane between mask and wafer in proximity lithography.The tilt between mask and wafer in the plane is reflected in the tilted fringe pattern.The method combining the 2D Fourier transform and 2D Hanning window is proposed for processing the tilted fringe pattern.The angles in the plane of tilt are extracted through phase analysis and the tilts are corrected.Computer simulation and experiment are both performed to verify this ...
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