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ICP-MS/MS直接测定高纯Eu2O3中超痕量的铥、砷、硅
Direct Determination of Thulium,Arsenic,Silicon in High Purity Eu2O3 by Triple Quadrupole Inductively Coupled-Plasma Mass Spectrometry
【摘要】 运用三重串联电感耦合等离子质谱(ICP-MS/MS)仪直接测定高纯Eu2O3中超痕量的Tm,As和Si。采用H2的原位质量法和O2质量转移法,有效克服了基体对待测元素的干扰。通过优化仪器参数得到Tm,As和Si的背景等效浓度分别为0.0005763,0.08435,8.268μg·L-1。在选定条件下,样品加标回收率为95.74%103.82%,相对标准偏差(RSD)为0.22%4.38%。本方法简单实用,能够满足纯度99.999%以上的高纯Eu2O3中杂质元素的快速测定。
【Abstract】 A method was developed for direct determination of Tm,As and Si in high purity europium by ICP-MS /MS. The interferences on the analysis were efficiently removed by using H2 and O2 reaction cell gas in MS / MS mode. Under the optimized conditions,the background equivalent concentration of 0. 0005763,0. 08435 and 8. 268 μg·L- 1 was achieved for Tm,As and Si,respectively. The spike recoveries of these three elements were 98. 71% 103. 26%,and the RSDs was 0. 22% 3. 75%. The method was suitable for the direct determination of impurities in high purity europium of 99. 999% or above.
【Key words】 triple quadrupole inductively coupled-plasma mass spectrometry; high purity neodymium; Tm; As; Si; Interference;
- 【文献出处】 中国稀土学报 ,Journal of the Chinese Society of Rare Earths , 编辑部邮箱 ,2016年04期
- 【分类号】O657.63;TQ133.3
- 【被引频次】7
- 【下载频次】157