制备了聚磷钨酸/壳聚糖-乙炔黑修饰电极(p-PTA/CS-AB/GCE),采用循环伏安法(CV)研究了氯霉素在该修饰电极上的电化学行为。结果表明,在p H 6.0的PBS溶液中,氯霉素(CAP)在该修饰电极上出现1个还原峰,在40~400 m V/s扫速范围内,CAP的还原峰电流与扫速呈线性关系,说明CAP在修饰电极上的电化学反应过程是受吸附控制的不可逆过程。用差分脉冲伏安法(DPV)对不同浓度的CAP进行检测,在5.0×10-7~1.0×10-4mol/L浓度范围内,还原峰电流与浓度呈线性关系,检出限(S/N=3)为5.13×10-8mol/L。用该方法对氯霉素片进行检测,相对标准偏差(RSD)为1.4%,回收率为97.7%~105.1%。
【英文摘要】
A new modified electrode(p-PTA/CS-AB/GCE) was prepared with phospho-tungstic acid,chitosan and acetylene black.The electrochemical behaviors of chloramphenicol(CAP) on pPTA/CS-AB/GCE were investigated by cyclic voltammetry(CV).The results showed that there was an obvious reduction peak of CAP on the modified electrode in p H 6.0 PBS buffer solution and the reduction peak current was linear to the scan rate in the range of 40-400 m V/s,indicating that the electrode process of CAP was controlled by absorption...
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