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电弧离子镀CrN_x薄膜的组织结构与性能研究
Study on Microstructure and Property of the CrN_x Thin Films by Arc Ion Plating
【摘要】 采用电弧离子镀技术在高速钢(HSS)基体上制备CrNx薄膜,考察氮气气压对CrNx薄膜的表面形貌、结构、显微硬度及摩擦系数的影响。用扫描电镜、X射线衍射仪、显微硬度计、摩擦磨损试验机等分别测试分析薄膜的表面形貌、薄膜的结构、显微硬度以及摩擦系数。结果表明,氮气气压较低时(0.1Pa),薄膜以Cr相为主;随着氮气气压的升高(0.54.0Pa),薄膜中出现了Cr2N和Cr的混合相,薄膜以Cr2N相为主;随着氮气气压的升高,薄膜的显微硬度在氮气气压为0.5Pa和4.0Pa时出现极值,CrNx薄膜的最大摩擦系数和平均摩擦系数都有所减少。
【Abstract】 The CrNxthin films were deposited by arc ion plating on substrate of high speed steel. The influence of vacuum chamber pressure on suface morphology,structure,microhardness and friction coefficient of the CrNxthin films were investigated. The surface morphology,structure,microhardness and friction coefficient of the CrNxthin films were tested with scanning electron microscopy,X-ray diffractometer,microhardness tester,friction wear testing machine and so on. In the low pressure nitrogen( 0. 1 Pa),the thin film phase group become Cr phase,with the nitrogen pressure increased( 0. 5 4. 0 Pa),thin film phase group become Cr2N phase and Cr phase,the thin film is given priority to with Cr2N phase. With the nitrogen pressure increased,the microhardness of the films express a maximum at the nitrogen pressure of 0. 5 Pa and 4. 0 Pa,the maximum friction coefficient and the average friction coefficient is smaller.
【Key words】 the CrNx thin films; arc ion plating; nitrogen partial pressure; microhardness; friction coefficient;
- 【文献出处】 沈阳理工大学学报 ,Journal of Shenyang Ligong University , 编辑部邮箱 ,2016年06期
- 【分类号】TG174.4
- 【下载频次】90