节点文献

氮化硅加入量对碳化硅-氮化硅-莫来石复相材料氧化层的影响

Effect of Addition of Silicon Nitride on the Oxide Layer of Silicon Nitride Silicon Mullite Composites

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 张雍郝岑刘曙光

【Author】 Zhang Yong;Hao Cen;Liu Shuguang;College of Materials Science and Engineering,Shandong University of Technology;

【机构】 山东理工大学材料科学与工程学院

【摘要】 以莫来石、红柱石、氮化硅、碳化硅为主要原料,在空气气氛下烧成制备碳化硅-氮化硅-莫来石复相材料,并采用XRD、SEM样品进行了表征。结果表明:碳化硅化硅-氮化硅-莫来石复合材料在烧结过程中会在试样表面形成氧化层,分为氧化膜和致密层。氧化膜的主要成分为Si O2,其主要是碳化硅和氮化硅的氧化产物,随着试样中氮化硅含量的增加,试样表面形成的Si O2逐渐增多;试样截面出现致密层,随着试样中氮化硅含量的增加,试样的致密层厚度逐渐减小。

【Abstract】 The silicon nitride silicon mullite composites was prepared by using mullite,andalusite,silicon nitride and silicon carbide as the main raw material,sintered under the air atmosphere. The prepared samples were characterized by XRD and SEM. The results show that the silicon nitride silicon mullite composites will form a layer of oxide film on the surface of the specimen in the sintering process,the main component of the oxidation film is Si O2,which is mainly the oxidation product of silicon carbide and silicon nitride,with the increase of the content of silicon nitride in the samples,the Si O2increased; The section of samples appear dense layer,with the increase of silicon nitride content in the samples,the thickness of the dense layer decreases gradually.

【关键词】 氮化硅碳化硅氧化层
【Key words】 silicon nitridesilicon carbideoxide layer
  • 【文献出处】 山东化工 ,Shandong Chemical Industry , 编辑部邮箱 ,2016年04期
  • 【分类号】TB33
  • 【下载频次】80
节点文献中: 

本文链接的文献网络图示:

本文的引文网络