【摘要】 集成电路规模庞大、结构复杂,随着集成电路制造工艺进入纳米尺度,复杂制造工艺中的工艺波动严重影响电路性能,给集成电路设计带来了巨大的挑战.集成电路互连线建模与光刻仿真涉及大规模Maxwell方程的数值求解,计算复杂度高、规模庞大.本文主要综述了在973项目资助下,基于中国科学院科学与工程计算国家重点实验室陈志明教授提出的并行自适应有限元理论及大规模并行计算平台PHG发展的纳米集成电路互连线建模和光刻仿真的大规模并行计算方法.在集成电路互连线建模方面,一方面,综述了寄生电容参数提取的并行自适应有限元方法 ParAFEMCap,该方法实现了可以在上百乃至上千CPU核上运行的并行寄生电容提取,在1536 CPU核计算平台上达到75.7%左右的并行效率;另一方面,综述了一种结合边界元法和随机法的混合算法BIE-WOS,用于导体或介质面电荷密度计算,该方法具有随机法天然并行性的优势,易于实现大规模并行计算,本文进一步在5120核计算平台上验证了算法近似线性的并行加速比.在光刻仿真方面,基于自适应有限元计算框架(PHG)提出了集成电路光刻的并行自适应仿真方法,采用各项异性的单轴完美匹配层方法处理散射边界条件.更多还原

【Abstract】 VLSI is large in scale,and complex in structure.In today’s nano-VLSI,serious process variations induced by the complex nanometer integrated circuit process technology may result in severe degradation of the integrated circuit performance.These factors present ever increasing challenges for present day nano-scale VLSI design.Interconnect modeling and lithography simulations rely on numerical approaches for solving large-scale Maxwell’s equations,of which the computational cost is extremely high.In this paper,several massively parallel computing approaches for interconnect modeling and lithography simulation are surveyed,based on adaptive finite element theory and a parallel hierarchical grid(PHG) platform.Regarding interconnect modeling,we first review the parallel adaptive finite-element method Par AFEMCap for parasitic capacitance extraction,which achieves a parallel efficiency of 75.7% on 1536 CPU cores.In addition,we review a hybridization of the boundary integral equation method and the random walk on spheres method(BIE-WOS) for surface charge density computations for conductors or dielectric mediums.The proposed method proves to be superior to existing methods for massively parallel computing.On a supercomputer with 5120 CPU cores,BIE-WOS can achieve almost a linear parallel efficiency.Regarding lithography simulation,we propose a parallel adaptive finite-element framework method by adopting the PHG(parallel hierarchical grid) platform and a perfectly matched anisotropy uniaxial layer to handle scattering boundary conditions.更多还原