【摘要】 采用电化学沉积方法在NiCl₂、离子液体和有机液体（DMF）混合体系中制备出结构和性能优异的NiO电致变色薄膜。采用SEM、XRD、紫外-可见分光光度仪、电化学工作站对薄膜的形貌、物相、光学及电化学等方面进行了研究。通过对沉积电位和时间的控制,实现了对薄膜厚度和微结构的控制。结果表明,在室温下,在沉积电位为3.0 V,沉积时间30 s的条件下,所得到的NiO薄膜具有最佳光学性能,其消/着色态透光率差值达到52.7%。在沉积电位3.9 V,沉积时间20 s条件下,薄膜具有最快的响应时间（t_b/t_c=0.32 s/0.30 s）。更多还原

【Abstract】 NiO electrochromic thin films were synthesized by electrodeposition in a mixture solution of NiCl₂,ionic liquid and N-N-dimethy formamide（ DMF）. The morphology,component,optical and electrochemical properties of NiO films were investigated by using a scanning electronic microscope（ SEM）,an ultraviolet-visible（ UVvis） spectrophotometer and an X-ray diffractometer（ XRD）. Cyclic voltammetry（ CV）,cycle life,response time as well as transmittance of the films were measured. Results show that the films have porous structures. The microstructure and thickness of NiO films can be controlled by controlling the deposition potential and time. The optical modulation（ ΔT） of the film deposited at 3. 0 V for 30 s reaches 52. 7%. The fastest switch speeds（ t_b/ t_c= 0. 32 s /0. 30 s） were obtained from the NiO film prepared at 3. 9 V for 20 s.更多还原