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微量Ni对Sn/Cu界面组织形貌及柯氏孔洞形成的影响

Effect of minor Ni addition on the microstructure and Kirkendall void formation at Sn/Cu interface

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【作者】 杨扬温贻芳余春

【Author】 Yang Yang;Yu Chun;Wen Yifang;Department of Mechanical and Electrical Engineering,Suzhou Institute of Industrial Technology;School of Materials Science and Engineering,Shanghai Jiao Tong University;

【机构】 苏州工业职业技术学院机电工程系上海交通大学材料科学与工程学院

【摘要】 通过对反应界面微观组织形貌的表征分析,系统研究了热老化条件下微量Ni元素对Snx Ni/Cu(x的质量分数为0,0.05%,0.10%)的界面组织形貌演变及柯肯达尔孔洞形成的影响。结果表明,相对于Sn/Cu界面,添加的Ni元素大幅加速了Snx Ni/Cu界面(Cu,Ni)6Sn5层的生长,但显著阻缓了(Cu,Ni)3Sn层的形成,有效抑制了柯肯达尔孔洞的形成。(Cu,Ni)6Sn5层由多层细小晶粒组成,这种多晶界结构有利于界面组分元素的互扩散,可缓解Cu和Sn的不平衡扩散;薄的(Cu,Ni)3Sn层限制了孔洞的形成空间,从而进一步抑制孔洞的形成。

【Abstract】 The effects of minor Ni addition on the evolution of microstructure and formation of Kirkendall voids at Snx Ni / Cu interface( x = 0,0. 05,0. 1 wt. %) under thermal aging were systemically studied through the characterization analysis of interfacial microstructure. The results indicated that comparing with the morphology at Sn/Cu interface,the addition of minor Ni dramatically accelerated the growth of( Cu,Ni)6Sn5 layer at Snx Ni / Cu interface,while inhibited the formation of(Cu,Ni)3Sn layer and Kirkendall voids effectively.( Cu,Ni)6Sn5 layer consisted of multi-layer small-sized grains. This kind of structure had plenty of grain boundaries,which was helpful for the interdiffusion of interfacial component elements,and could relieve the unbalanced diffusion. The thin( Cu,Ni)3Sn layer restricted the formation space of voids,and inhibited the formation of voids furtherly.

【基金】 国家自然科学基金项目(51105251);江苏省自然科学基金项目(BK20161228)
  • 【分类号】TN405
  • 【被引频次】2
  • 【下载频次】164
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