Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime

【摘要】 Metal hydrazone complex thin films are used as laser patterning materials,and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup(λ=405 nm,NA=0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns,there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths.更多还原

【Abstract】 Metal hydrazone complex thin films are used as laser patterning materials,and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup(λ=405 nm,NA=0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns,there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths.更多还原