【摘要】 采用直流磁控溅射镀膜工艺,在不同的氮氩流量比条件下,制备了玻璃基TiN薄膜。通过X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM、EDS)、纳米显微硬度仪,研究了TiN薄膜的组织结构、物相组成、表面形貌、元素成份、维氏硬度,分析了氮氩流量比对TiN薄膜结晶取向、硬度的影响机理。结果表明,在低的氮氩流量比条件下,TiN薄膜以(111)晶面择优取向;随着氮氩流量比增加,择优取向由(111)晶面向(200)晶面过渡;氮氩流量比为1∶2时薄膜以(200)晶面择优取向;继续增加氮氩流量比(1∶2~2∶1),TiN薄膜衍射峰强度降低,晶粒尺寸减小;当氮氩流量比增加到2∶1时,薄膜开始呈现非晶态。随着氮氩流量比的增加,薄膜硬度呈现先增加后减小的趋势;当氮氩流量比为1∶1时,TiN薄膜以(200)晶面择优取向结晶,组织致密均匀,晶粒尺寸最小,具有最大的硬度值(825 HV),相比未镀膜的玻璃基片,硬度值增加了20.44%。更多还原

【Abstract】 TiN thin films were deposited on commom glass substrates under different N₂/ Ar flow ratio by DC reactive magnetron supttering. The structure, compositions of phase, morphology, element composition,Vickers hardness of TiN thin films were researched by using X-ray diffraction（ XRD）,field emission scanning electron microscope（ SEM,EDS）,nano-hardness tester. The mechanisms of different N₂/ Ar flow ratio on crystal preferential orientation and hardness of TiN thins film were discussed. The results show that when N₂/ Ar flow ratio was in low condition,The preferential orientation was（ 111）.With the increase of N₂/ Ar flow ratio,the preferential orientation of TiN transforms from（ 111） to（ 200）. When N₂/ Ar flow ratio was 1∶ 2,The preferential orientation was（ 200）. Continued to increase the N₂/ Ar flow ratio（ 1 ∶ 2 to 2 ∶ 1）,the peak intensity of the crystal weakened and size of grain decreased. When the N₂/ Ar flow ratio was 2∶ 1,TiN thin films show in amorphous. With the increase of N₂/ Ar flow ratio,the hardness of TiN thin films increased firstly. However,when the N₂/ Ar flow ratio was increased continuously,the hardness of TiN thin films decreased then. When N₂/ Ar flow ratio was 1∶ 1,the preferential orientation of TiN thin films was（ 200）,the structure was dense and uniform. Andsize of grain was the smallest. It had a maximum hardness（ 825 HV）. Compared to ordinary glass substrates,the hardness increased by 20. 44%.更多还原