【摘要】 利用磁控溅射方法在Si(111)衬底上制备了厚度为1μm的非晶SiN_x薄膜,采用纳米压痕方法研究了薄膜的变形和断裂行为。傅立叶变换红外光谱显示实验获得了较为纯净的SiN_x薄膜。SiN_x薄膜在纳米压痕下呈现出放射状的脆性断裂特征,随着压入深度的增大,放射状裂纹的长度逐渐增加。最大压入深度达到1 500nm时,薄膜和衬底间出现了扇形的界面断裂,并且这一界面断裂是在卸载过程中发生的。到最大压入深度达到2 500nm时,原位原子力显微镜照片可以清晰的观察到界面断裂及放射状裂纹。界面断裂韧性计算结果表明,SiN_x薄膜和Si(111)衬底间易形成脆性较大的共价结构界面,这是其界面断裂韧性较小的原因。更多还原

【Abstract】 An amorphous SiN_x coating was deposited on a Si(111)substrate by using reactive magnetron sputtering a Si target.The deformation mechanisms and fracture behavior of the coating is characterized by nanoindentation experiments.FT-IR spectrum shows that the coating does not contain impurities like the Si—O bond.The SiN_x coating shows median/radial fracture properties like the Si(111)substrate during nanoindentation experiments,and the cracks develop with the increase of displacement.As the peak displacement increases to1 500 nm,a fan-like interfacial fracture between two median/radial fractures is observed during the unload segment.When the peak displacement increases to 2 500 nm,an obvious blister with a diameter of 27.3μm were observed on the AFM image.The low interfacial fracture toughness value may be due to the appearance of covalence microstructures between the SiN_x coating and the Si(111)substrate.更多还原