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纳米SiO2在化学镀Ni-P合金镀液中的分散性研究
Dispersity of Nano-SiO2 in the Electroless Ni-P Alloy Plating Solution
【摘要】 采用红外-紫外-可见分光光度计法研究了不同表面活性剂、配位剂、纳米SiO2和p H对纳米粒子在溶液中的分散性和稳定性的影响;讨论了在不同温度和纳米粒子含量下,纳米粒子在铜表面的沉积速度。实验结果表明,化学复合镀Ni-P合金最佳工艺及操作条件是表面活性剂为5 g/L十二烷基硫酸钠,配位剂为13 g/L醋酸钠,2 m L/L乳酸,p H为5.05.5,3 g/L纳米SiO2,θ为8085℃。
【Abstract】 The effects of different surfactants,ligands,nano-SiO2 and p H on the dispersity and stability of the nano-particles in the aqueous solution were studied by infrared-ultraviolet-visible spectrophotometry.The plating velocity of the nano-particles on the surface of Cu substrates were discussed at different temperatures and contents. The experimental results showed that the optimal process and operating conditions of electroless composite plating Ni- P alloys were obtained,including SDS as surfactants( 5 g / L),Na Ac as ligands( 13 g / L),lactic acid( 2 m L / L),p H( 5. 0 5. 5),nano-SiO2( 3 g /L) and temperature( 80 85 ℃).
【Key words】 dispersity; nano-SiO2; composite electroless plating; spectrophotometry;
- 【文献出处】 电镀与精饰 ,Plating & Finishing , 编辑部邮箱 ,2016年08期
- 【分类号】TB306
- 【被引频次】3
- 【下载频次】116