【摘要】 本文应用磁控溅射技术（MS）和混合物理化学气相沉积法（HPCVD）在单晶Al₂O₃基底上制备MgB₂/Ta多层膜.通过扫描电子显微镜（SEM）、原子力显微镜（AFM）、X射线衍射（XRD）和标准四线法对MgB₂/Ta试样的表面形貌、晶体结构、超导特性及断面结构进行了测量研究.结果表明MgB₂/Ta多层膜结构清晰,超导薄膜显示出良好的超导特性.更多还原

【Abstract】 The MgB₂/Ta multilayer were fabricated,which the MgB₂ layers were grown by using the hybrid physics-chemistry vapor deposited（HPCVD）,the Ta films were prepared with Magnetron sputtering technology.Scanning electron microscopy,X-ray diffraction,atomic force microscope and our-point probe method were carried out to study cross-sectional structure,superconducting properties and crystal structure of MgB₂/Ta multilayer.The results addressed that the structure of MgB₂/Ta multilayer film is clear and the superconducting thin films show good characteristics.更多还原