【摘要】 金属有机化学气相沉积外延技术(MOCVD)是利用金属有机化合物进行金属输运的一种气相外延生长技术,是大规模生产第三代半导体光电子、微电子器件的重要方法,也是制备半导体异质结、超晶格、量子阱等低维结构的主要手段。第三代半导体材料的飞速发展对MOCVD设备提出了更高的要求,MOCVD在线监测技术作为控制生长过程的前提,面临更多的挑战。该文综合介绍和比较了当今各种MOCVD在线监测技术的发展情况,并对MOCVD在线监测技术中的关键技术——红外测温、生产信息、曲率测量、光致发光做出简要介绍和看法。更多还原

【Abstract】 Metal organic chemical vapor deposition(MOCVD) is a vapor-phase epitaxial growth technology that transports metal by using metal organic compound. It is the most important method for large-scale manufacturing the third generation of semiconductor such as photonics and microelectronics devices. It is also the main method for preparing low-dimensional structures like semiconductor heterojunction, superlattices and quantum wells. The in-situ monitoring is a key for successful material deposition, which brings challenges to the equipment manufacture. This paper gives brief introduction and comparison of the newest in-situ monitoring technologies in recent years, and describes the key technologies like temperature monitoring, growth rate monitoring, curvature measurement and photoluminescence(PL).更多还原