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Total dose effects on the g–r noise of JFET transistors

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【作者】 胡为; 庄奕琪; 包军林; 赵启凤;

【Author】 Hu Wei;Zhuang Yiqi;Bao Junlin;Zhao Qifeng;School of Mechano-Electronic Engineering, Xidian University;

【机构】 School of Mechano-Electronic Engineering, Xidian University;

【摘要】 Silicon junction field effect transistors(JFETs) have been exposed to Co60-rays to study radiationinduced effects on their dc characteristics and noise. The devices have been irradiated and measured at room temperature up to an accumulated 100 krad(Si) dose of radiation at a dose rate of 0.1 rad(Si)/s. During irradiation,the generation–recombination(g–r) noise increase has been observed while the dc characteristics of the transistors were kept unchanged. The increasing of the density of the same type point defects and their probability of trapping and detrapping carriers caused by irradiation have been used to explain the g–r noise amplitude increase, while the g–r noise characteristic frequency has only a slight change.

【Abstract】 Silicon junction field effect transistors(JFETs) have been exposed to Co60-rays to study radiationinduced effects on their dc characteristics and noise. The devices have been irradiated and measured at room temperature up to an accumulated 100 krad(Si) dose of radiation at a dose rate of 0.1 rad(Si)/s. During irradiation,the generation–recombination(g–r) noise increase has been observed while the dc characteristics of the transistors were kept unchanged. The increasing of the density of the same type point defects and their probability of trapping and detrapping carriers caused by irradiation have been used to explain the g–r noise amplitude increase, while the g–r noise characteristic frequency has only a slight change.

【基金】 Project supported by the National Natural Science Foundation of China(Nos.61076101,61204092);the Fundamental Research Funds for the Central Universities(No.JB150412)
  • 【文献出处】 Journal of Semiconductors ,半导体学报(英文版) , 编辑部邮箱 ,2016年03期
  • 【分类号】TN386
  • 【下载频次】27
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