【摘要】 基于激光干涉光刻的基本原理,设计了新型的可应用于大面积光刻的激光图案检测系统,并阐述了利用电荷耦合元件对光刻图案的CMOS实时检测及实现大面积光刻的方法。实验结果表明,使用激光干涉光刻技术可以产生大面积的亚微米级周期性图案。该方法提供了得到高分辨、无限焦深、大面积光刻的可能性。更多还原

【Abstract】 The laser interference lithography is applied to design a lithographic patterns detection system for large area lithography by using complementary metal oxide semiconductor(CMOS).Experiments show that laser interference lithography technique is feasible to produce the sub-micron periodic graphics in large area.It shows the potential of interference lithography on high resolution,infinite focal depth and large area.更多还原