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铝薄膜结构第一镜氢离子溅射特性研究

Impact of Hydrogen Plasma Etchingon Surface of Highly Reflective Mirror for Optical Diagnosis International Thermonuclear Experimental Reactor

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【作者】 公发全李刚谭艳楠张敏周徐阳牟宗信刘万发董闯

【Author】 Gong Faquan;Li Gang;Tan Yannan;Zhang Min;Zhou Xuyang;Mu Zongxin;Liu Wanfa;Dong Chuang;Key Laboratory of Chemical Lasers,Dalian Institute of Chemical Physics,Chinese Academy of Sciences;Key Laboratory of Materials Modification by Laser,Ion,Electron Beams,Education Ministry,Dalian University of Technology;Schooh Physics and Electronic Technology,Liaoning Normal University;

【机构】 中国科学院化学激光重点实验室中国科学院大连化学物理研究所大连理工大学三束材料改性教育部重点实验室辽宁师范大学物理与电子技术学院

【摘要】 采用电子束蒸发镀膜工艺,在不同的基底材料上镀制了Al和Al2O3/Al薄膜,研制了国际热核聚变实验堆光学诊断中用具有较高反射率薄膜第一镜。通过中频脉冲偏压方法产生氢等离子体,对薄膜第一镜在氢等离子溅射下性能及特性进行比较分析。研究结果表明:在本实验氢离子溅射条件下,第一镜样品表面污染物的沉积速度大于溅射速度,样品表面沉积了少量的真空室内物质,通过X射线光电子能谱分析证实金属污染物均为氧化物,对光谱反射率影响较小。而由于基底和膜层结构的不同,薄膜第一镜自身结构的稳定性差异较大,其中Al/SS304和Al2O3/Al/Si O2样件表现出很好的耐等离子溅射稳定性,可以成为第一镜的备选方案。

【Abstract】 The negative impact ofthe highly reflective mirror,the 1st mirror fabricated with Al and / or Al2O3/ Al coatings grown by electron beam evaporation on different substrates and used in international thermonuclear experimental reactor( ITER) for optical diagnosis,was investigated with the hydrogen plasma generated by mid-frequency pulsed voltage. The microstructures and contents of the plasmaetched surfaces were characterized with X-ray diffraction,X-ray photoelectron spectroscopy,scanning electron microscopy and atomic force microscopy. The results show that thin layers of transparent metals oxides,mainly from the chamber walls and little affecting the mirror’s reflectivity,were synthesized on the surface,possibly because their deposition rateswere faster than the plasma etching rate. In addition,when it comes to thermal stability and cost,Al coatings on stainless steel( SS304) and / or Al / SiO2 films coated with Al2O3 outperforms the single crystalline metal coatings as the 1st mirror’s material.

【基金】 国家自然科学基金项目(51131002);国家自然科学基金青年基金项目(51101080);教育部留学归国人员科研启动基金项目(2012940)
  • 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2015年08期
  • 【分类号】TB383.2;TQ133.1
  • 【下载频次】107
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